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Proceedings Paper

Preparation and performance of silicon microchannel plate
Author(s): Qingduo Duanmu; Jingquan Tian; Ye Li; Tangren Dan; Yaohua Lu; Delong Jiang; Lichen Fu
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Paper Abstract

A silicon microchannel plate (Si-MCP), with 15-25 aspect ratio of the microchannel, 6-20 microns diameter and 6-8 microns space, was prepared by Inductively Coupled Plasma (ICP) and LPCVD. The inner surface topography of microchannel was surveyed, the bulk resistance 7.3 mega ohm and electron gain 110 of MCP were tested by ultraviolet optoelectronic method. The plasma-etching lag in processing the microchannel array was analyzed and discussed. Finally, we compared the electron gain of silicon microchannel plate with traditional glass one. Our work proved the feasibility of making Si-MCP by microfabrication and semiconductor process.

Paper Details

Date Published: 15 October 2001
PDF: 4 pages
Proc. SPIE 4601, Micromachining and Microfabrication Process Technology and Devices, (15 October 2001); doi: 10.1117/12.444697
Show Author Affiliations
Qingduo Duanmu, Changchun Institute of Optics and Fine Mechanics (China)
Jingquan Tian, Changchun Institute of Optics and Fine Mechanics (China)
Ye Li, Changchun Institute of Optics and Fine Mechanics (China)
Tangren Dan, Changchun Institute of Optics and Fine Mechanics (China)
Yaohua Lu, Changchun Institute of Optics and Fine Mechanics (China)
Delong Jiang, Changchun Institute of Optics and Fine Mechanics (China)
Lichen Fu, Changchun Institute of Optics and Fine Mechanics (China)


Published in SPIE Proceedings Vol. 4601:
Micromachining and Microfabrication Process Technology and Devices

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