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Proceedings Paper

Modeling and fabrication of micro 3K-2-type planetary gear reducer utilizing SU-8 photoresist as alternative LIGA technology
Author(s): Weiping Zhang; Wenyuan Chen; Di Chen; Xiaomei Chen; Xiaosheng Wu; Zhengfu Xu
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Paper Abstract

The LIGA type process, utilizing SU-8 photoresist as alternative LIGA technology, can fabricate high aspect ratio microstructures without employing synchrotron light and suitable X-ray mask. Based on LIGA type process in this paper, detailed investigations of the modeling and fabrication of micro 3K-2 type planetary gear reducer, such as the modeling and design of micro reducer, CAD of micro gear mask, SU-8 UV photolithography, micro electroforming, micro molding, have been performed. And 400 um thickness sun gear, 400 um thickness planet gear, 200 um thickness fixed inner gear, and 200 um thickness rotary inner gear, whose teeth are 15,11,36,39 respectively, have been obtained. Utilizing these gears, the micro reducer whose modulus, outer diameter and velocity ratio are 0.03, 2mm, 44.2:1, has been assembled and applied in (phi) 2mm micro electro magnetic motor successfully.

Paper Details

Date Published: 15 October 2001
PDF: 7 pages
Proc. SPIE 4601, Micromachining and Microfabrication Process Technology and Devices, (15 October 2001); doi: 10.1117/12.444690
Show Author Affiliations
Weiping Zhang, Shanghai Jiao Tong Univ. (China)
Wenyuan Chen, Shanghai Jiao Tong Univ. (China)
Di Chen, Shanghai Jiao Tong Univ. (China)
Xiaomei Chen, Shanghai Jiao Tong Univ. (China)
Xiaosheng Wu, Shanghai Jiao Tong Univ. (China)
Zhengfu Xu, Shanghai Jiao Tong Univ. (China)


Published in SPIE Proceedings Vol. 4601:
Micromachining and Microfabrication Process Technology and Devices

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