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Proceedings Paper

Metrology issues associated with submicron linewidths
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Paper Abstract

The three conventional techniques--optical, low voltage scanning electron microscopy (LVSEM), and electrical linewidth measurement--continue to be employed, but each technique has unique applications, problems, and limitations. In this paper these techniques are investigated for submicron linewidth metrology. A great deal of emphasis is placed on the calibration of these tools and the potential for problems associated with the tools.

Paper Details

Date Published: 1 July 1991
PDF: 14 pages
Proc. SPIE 1464, Integrated Circuit Metrology, Inspection, and Process Control V, (1 July 1991); doi: 10.1117/12.44455
Show Author Affiliations
Khoi A. Phan, Advanced Micro Devices, Inc. (United States)
John L. Nistler, Advanced Micro Devices, Inc. (United States)
Bhanwar Singh, Advanced Micro Devices, Inc. (United States)


Published in SPIE Proceedings Vol. 1464:
Integrated Circuit Metrology, Inspection, and Process Control V
William H. Arnold, Editor(s)

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