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Proceedings Paper

Semiconductor thin-film optical constant determination and thin-film thickness measurement equipment correlation
Author(s): Anne M. Kaiser
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Paper Abstract

There are several methods for correlating thin film thickness measurement equipment. The most commonly used method is to program in an offset that gets systematically added to or subtracted from the thickness calculation. Measurement errors can occur using this 'fudge factor' method because the relationship between the reference thicknesses and the measured thicknesses is not, in general, a fixed constant or simple function. A better method for correlating thin film thickness measurement equipment is to tune the instruments to the process by refining the internal optical constants.

Paper Details

Date Published: 1 July 1991
PDF: 7 pages
Proc. SPIE 1464, Integrated Circuit Metrology, Inspection, and Process Control V, (1 July 1991); doi: 10.1117/12.44451
Show Author Affiliations
Anne M. Kaiser, Digital Equipment Corp. (United States)


Published in SPIE Proceedings Vol. 1464:
Integrated Circuit Metrology, Inspection, and Process Control V
William H. Arnold, Editor(s)

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