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Proceedings Paper

Optical metrology for integrated circuit fabrication
Author(s): Stanley S. C. Chim; Gordon S. Kino
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Paper Abstract

A new tool for optical metrology, the Mirau Correlation Microscope (MCM), it introduced. The basic principle of this device is to employ an interference microscope with a temporally and spatially incoherent illumination source, and to use as the detected output the interference signal between the beams reflected from the object and from a reference mirror, respectively. Phase images and cross-sectional images of integrated circuits are obtained. Critical dimension measurements on photoresist linewidths are demonstrated and features with sizes down to 0.4 micrometers have been measured consistently.

Paper Details

Date Published: 1 July 1991
PDF: 7 pages
Proc. SPIE 1464, Integrated Circuit Metrology, Inspection, and Process Control V, (1 July 1991); doi: 10.1117/12.44430
Show Author Affiliations
Stanley S. C. Chim, Stanford Univ. (United States)
Gordon S. Kino, Stanford Univ. (United States)


Published in SPIE Proceedings Vol. 1464:
Integrated Circuit Metrology, Inspection, and Process Control V
William H. Arnold, Editor(s)

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