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Proceedings Paper

Design and fabrication of micromirror arrays for UV lithography
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Paper Abstract

Modern UV-lithography is searching for new highly parallel writing concepts. Spatial light modulation (SLM) offers such possibilities but special emphasis must be put on the ability of SLM devices to handle ultraviolet light (UV). We designed and fabricated micromirror arrays which fulfill these requirements. Possible applications for such UV-SLMs are direct writing systems for semiconductor and printing, and UV-stimulated biochemistry. For deep UV laser pattern generation (248 nm) e.g. we designed and fabricated a 2048x512 pixel UV-SLM with individually addressable aluminum micromirrors. They are illuminated by an excimer laser pulse and imaged onto a photomask substrate. A complete pattern is stitched together at a rate of 1 kHz. The minimum feature size is 320 nm and analog modulation of the pixels allows to realize an address grid of only 1.6 nm. The design of the array is modular so that other array sizes can be tailor made to customers needs. Design and fabrication aspects for a CMOS compatible realization of these micromirror arrays are addressed as well as their performance in lithography applications.

Paper Details

Date Published: 2 October 2001
PDF: 10 pages
Proc. SPIE 4561, MOEMS and Miniaturized Systems II, (2 October 2001); doi: 10.1117/12.443094
Show Author Affiliations
Hubert K. Lakner, Fraunhofer-Institut fuer Mikroelektronische Schaltungen und Systeme (Germany)
Peter Duerr, Fraunhofer-Institut fuer Mikroelektronische Schaltungen und Systeme (Germany)
Ulrike Dauderstaedt, Fraunhofer-Institut fuer Mikroelektronische Schaltungen und Systeme (Germany)
Wolfgang Doleschal, Fraunhofer-Institut fuer Mikroelektronische Schaltungen und Systeme (Germany)
Joerg Amelung, Fraunhofer-Institut fuer Mikroelektronische Schaltungen und Systeme (Germany)


Published in SPIE Proceedings Vol. 4561:
MOEMS and Miniaturized Systems II
M. Edward Motamedi; Rolf Goering, Editor(s)

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