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Proceedings Paper

Design and fabrication of micromachined microwave transmission lines
Author(s): Yanling Shi; Zongsheng Lai; Peisheng Xin; Li Shao; Ziqiang Zhu
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Paper Abstract

Microwave transmission lines have been designed and fabricated by the CMOS technology on Si substrates with low and high resistivities. First, We analyzed the characteristic impedance of the microwave coplanar waveguides (CPW) with a new similarity method in FEM, which is especially useful for research of the problems about the nonuniform and irregular region, such as the case of micromachined microwave coplanar waveguide. By using this method, we calculated the characteristic impedance of MEMS waveguide and analyzed the change with its different dimensions. Then the samples with characteristic impedances of 120(Omega) and 50(Omega) were fabricated through the surface micromachining and bulk micromachining. Measurements have been performed at frequencies from 1 to 40GHz. The insert loss of transmission-line showed great improvement after the structures were suspended. At 30GHz, the insert loss was about 7dB/cm, reduced by more than 10dB/cm compared with without suspended. To compare with the transmission lines on the low-resistivity silicon (low-R Si), we also fabricated the transmission lines directly on the high-resistivity Si substrate (high-R Si), the insert loss was only 1-4dB/cm at the frequencies from 1 to 40GHz.

Paper Details

Date Published: 28 September 2001
PDF: 8 pages
Proc. SPIE 4557, Micromachining and Microfabrication Process Technology VII, (28 September 2001); doi: 10.1117/12.442983
Show Author Affiliations
Yanling Shi, East China Normal Univ. (China)
Zongsheng Lai, East China Normal Univ. (China)
Peisheng Xin, East China Normal Univ. (China)
Li Shao, East China Normal Univ. (China)
Ziqiang Zhu, East China Normal Univ. (China)


Published in SPIE Proceedings Vol. 4557:
Micromachining and Microfabrication Process Technology VII
Jean Michel Karam; John A. Yasaitis, Editor(s)

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