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Proceedings Paper

Photochemical selective surface modification using micromirror array for biochip fabrication
Author(s): Kook-Nyung Lee; Dong-Sik Shin; Woo-Jae Chung; Yoon-Sik Lee; Yong-Kweon Kim
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Paper Abstract

Two dimensional micromirror array(MMA) is designed and fabricated to be used as a spatial light modulator for biochip fabrication. The optical projection system is setup using the MMA for maskless photolithography process, which is applied to photochemical surface modification. The photoresist (AZ1512) pattern is fabricated by the MMA projection in the maskless photolithography system, which consists of MMA and other optical components like projection lens. The patterned PR on a chip substrate is analyzed to improve pattern edge definition. The parameters of the optical system, which are lens location, incident angle of the UV light and the MMA location, are adjusted to obtain fine pattern edge definition by the MMA deflection. To immobilize proteins on the specific surface regions of a chip substrate to make protein patterning, nitroveratryloxycarbonyl(NVOC) group is used as a photolabile protecting group. The surface which is protected by NVOC group, is selectively irradiated by UV illuminator using the MMA. After removing the NVOC group, FITC(fluorescein isothianade) is tagged to the NVOC-cleaved site to find out the photo-cleavage condition of NOVC group by UV irradiation in the maskless photolithography system. Using the photocleavage condition, biotin was coupled to the NVOC-cleaved site. Then, we could obtain streptavidin-patterned surface.

Paper Details

Date Published: 28 September 2001
PDF: 8 pages
Proc. SPIE 4557, Micromachining and Microfabrication Process Technology VII, (28 September 2001); doi: 10.1117/12.442965
Show Author Affiliations
Kook-Nyung Lee, Seoul National Univ. (South Korea)
Dong-Sik Shin, Seoul National Univ. (South Korea)
Woo-Jae Chung, Seoul National Univ. (South Korea)
Yoon-Sik Lee, Seoul National Univ. (South Korea)
Yong-Kweon Kim, Seoul National Univ. (South Korea)

Published in SPIE Proceedings Vol. 4557:
Micromachining and Microfabrication Process Technology VII
Jean Michel Karam; John A. Yasaitis, Editor(s)

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