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Proceedings Paper

Micromachining of ultrananocrystalline diamond
Author(s): Nicolai A. Moldovan; Orlando H. Auciello; Anirudha Sumant; John Carlisle; Ralu Divan; Dieter M. Gruen; Alan R. Krauss; Derrick C. Mancini; A. Jayatissa; John Tucek
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Paper Abstract

Ultrananocrystalline diamond (UNCD) with grain sizes in the range of 2 - 5 nm is produced using a microwave plasma chemical vapor deposition process with argon-rich C60 or CH4 plasmas. This material has excellent mechanical properties: high hardness and Young modulus, and an extremely low friction coefficient (approximately 0.01). It is resistant to chemical attack, and is potentially biocompatible. These properties make UNCD a very good candidate for a diamond-based microelectromechanical systems (MEMS) technology. We report on the micromachinability of this material by selective seeding, selective growth and reactive ion etching, in conjunction with SiO2 sacrificial layers for fabricating 3-D structures with freestanding or movable parts. These micromachining techniques are used to develop a totally UNCD-made turbine as a demonstration for UNCD-based MEMS.

Paper Details

Date Published: 28 September 2001
PDF: 11 pages
Proc. SPIE 4557, Micromachining and Microfabrication Process Technology VII, (28 September 2001); doi: 10.1117/12.442958
Show Author Affiliations
Nicolai A. Moldovan, Argonne National Lab. (United States)
Orlando H. Auciello, Argonne National Lab. (United States)
Anirudha Sumant, Argonne National Lab. (United States)
John Carlisle, Argonne National Lab. (United States)
Ralu Divan, Argonne National Lab. (United States)
Dieter M. Gruen, Argonne National Lab. (United States)
Alan R. Krauss, Argonne National Lab. (United States)
Derrick C. Mancini, Argonne National Lab. (United States)
A. Jayatissa, Argonne National Lab. (United States)
John Tucek, Argonne National Lab. (United States)


Published in SPIE Proceedings Vol. 4557:
Micromachining and Microfabrication Process Technology VII
Jean Michel Karam; John A. Yasaitis, Editor(s)

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