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Proceedings Paper

Silicon grisms fabricated by anisotropic wet etching and direct silicon bonding for high-resolution IR spectroscopy
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Paper Abstract

Silicon grisms are very attractive as devices for IR spectroscopy in terms of high resolving power and compactness, necessary for many astronomical applications and for implementation of spectroscopic modes in large telescopes respectively. We present the fabrication process of a silicon grism as composed by an IR transmission grating coupled to a silicon prism. The silicon gratings were manufactured using silicon micromachining techniques, as electron beam lithography and wet anisotropic etching, achieving good uniformity over all the large surface (32 X 32 mm2) and grating facets of excellent optical quality; the final grism was realized by means of direct bonding of the grating onto the prism face. The results of laboratory tests on the first prototype are presented.

Paper Details

Date Published: 28 September 2001
PDF: 9 pages
Proc. SPIE 4557, Micromachining and Microfabrication Process Technology VII, (28 September 2001); doi: 10.1117/12.442946
Show Author Affiliations
Elena Cianci, Istituto di Elettronica dello Stato Solido (Italy)
Vittorio Foglietti, Istituto di Elettroncia dello Stato Solido (Italy)
Fabrizio Vitali, Osservatorio Astronomico di Roma (Italy)
Dario Lorenzetti, Osservatorio Astronomico di Roma (Italy)


Published in SPIE Proceedings Vol. 4557:
Micromachining and Microfabrication Process Technology VII
Jean Michel Karam; John A. Yasaitis, Editor(s)

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