Share Email Print

Proceedings Paper

Production considerations necessary to produce large quantities of optoelectronic devices by MOCVD epitaxy
Author(s): Steven I. Boldish
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Production requirements for Metal Organic Chemical Vapor Deposition (MOCVD) of optoelectronic devices are demanding. The MOCVD facilities and reactor can be viewed as a system with several critical parts that must be designed properly for the system to function successfully. An MOCVD system is described. Issues are reviewed which pertain to good surface morphology. Exhaust system considerations are described since these may frequently be overlooked in bringing a system into service. Finally a practical noncontact method for determining the liquid level of the metal organic (MO) source material is introduced. All of these issues are important for the production of optoelectronic devices.

Paper Details

Date Published: 1 June 1991
PDF: 14 pages
Proc. SPIE 1449, Electron Image Tubes and Image Intensifiers II, (1 June 1991); doi: 10.1117/12.44265
Show Author Affiliations
Steven I. Boldish, Ni-Tec Corp. (United States)

Published in SPIE Proceedings Vol. 1449:
Electron Image Tubes and Image Intensifiers II
Illes P. Csorba, Editor(s)

© SPIE. Terms of Use
Back to Top