
Proceedings Paper
In-situ CARS detection of H2 in the CVD of Si3N4Format | Member Price | Non-Member Price |
---|---|---|
$14.40 | $18.00 |
![]() |
GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. | Check Access |
Paper Abstract
Silicon nitride (Si3N4) has been demonstrated to be an effective high temperature anti-oxidant, especially when deposited
in its -ciysta1line form. UTRC has developed a pilot scale chemical vapor deposition (CVD) reactor capable of
depositing cv-Si3N4 from ammonia (NH3) and silicon tetrafluoride (SiF4) at 1450 C. Coherent anti-Stokes Raman spectroscopy
(CARS) has been applied to this reactor which has been fitted with line-of-sight optical access ports. Temperature
and concentration measurements have been performed on gas phase species during the deposition of Si3N4. Based
on the CARS detection of H2, the importance of high temperature surface (SiN4) catalyzed decomposition of NH3:
Paper Details
Date Published: 1 July 1991
PDF: 7 pages
Proc. SPIE 1435, Optical Methods for Ultrasensitive Detection and Analysis: Techniques and Applications, (1 July 1991); doi: 10.1117/12.44258
Published in SPIE Proceedings Vol. 1435:
Optical Methods for Ultrasensitive Detection and Analysis: Techniques and Applications
Bryan L. Fearey, Editor(s)
PDF: 7 pages
Proc. SPIE 1435, Optical Methods for Ultrasensitive Detection and Analysis: Techniques and Applications, (1 July 1991); doi: 10.1117/12.44258
Show Author Affiliations
Stephen O. Hay, United Technologies Research Ctr. (United States)
R. D. Veltri, United Technologies Research Ctr. (United States)
R. D. Veltri, United Technologies Research Ctr. (United States)
W. Y. Lee, United Technologies Research Ctr. (United States)
Ward C. Roman, United Technologies Research Ctr. (United States)
Ward C. Roman, United Technologies Research Ctr. (United States)
Published in SPIE Proceedings Vol. 1435:
Optical Methods for Ultrasensitive Detection and Analysis: Techniques and Applications
Bryan L. Fearey, Editor(s)
© SPIE. Terms of Use
