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Proceedings Paper

Development of a CMOS-compatible process for a silicon miniature microphone with high sensitivity
Author(s): Jing Chen; Litian Liu; Zhijian Li; Zhimin Tan
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Paper Abstract

In this paper, a CMOS compatible process for high sensitive silicon micron microphone has been proposed. Corrugated diaphragms have been introduced to reduce the initial stress. A MOS preamplifier with very high input impedance can be integrated in the same chip to meet the requirement on high output sensitivity, low power consumption and minimization. As a matter of fact, the polysilicon of the composite diaphragm can be patented as resistors and gates of MOSFET. All the CMOS process steps except the N well implantation and drive in can be placed after the microphone fabrication. This process is simple, efficient and seems very promising for future miro-acoustic systems.

Paper Details

Date Published: 14 September 2001
PDF: 4 pages
Proc. SPIE 4414, International Conference on Sensor Technology (ISTC 2001), (14 September 2001); doi: 10.1117/12.440209
Show Author Affiliations
Jing Chen, Tsinghua Univ. (China)
Litian Liu, Tsinghua Univ. (China)
Zhijian Li, Tsinghua Univ. (China)
Zhimin Tan, Tsinghua Univ. (China)

Published in SPIE Proceedings Vol. 4414:
International Conference on Sensor Technology (ISTC 2001)
Yikai Zhou; Shunqing Xu, Editor(s)

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