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Proceedings Paper

Writing accuracy of EBM-3500 electron-beam mask writing system
Author(s): Kenji Ohtoshi; Hitoshi Sunaoshi; Jun Takamatsu; Fumiyuki Okabe; K. Ishibashi; Shusuke Yoshitake; Hirokazu Yamada; Shuichi Tamamushi; Hirohito Anze; T. Kamikobo; Yoji Ogawa
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Paper Abstract

A high accuracy electron beam writing system EBM-3500 has been developed for 130 nm node lithography technology. The EBM-3500 is based on its predecessor EBM-3000 system and incorporates new features to improve writing accuracies. Based on the extensive error analyses of the EBM-3000, several important improvements in such areas as ground noise and stray magnetic field reductions, among others, have been made. Thanks to these improvements, EBM-3500 achieves high accuracies to satisfy the present and future technology requirements.

Paper Details

Date Published: 5 September 2001
PDF: 10 pages
Proc. SPIE 4409, Photomask and Next-Generation Lithography Mask Technology VIII, (5 September 2001); doi: 10.1117/12.438403
Show Author Affiliations
Kenji Ohtoshi, Toshiba Machine Co., Ltd. (Japan)
Hitoshi Sunaoshi, Toshiba Machine Co., Ltd. (Japan)
Jun Takamatsu, Toshiba Machine Co., Ltd. (Japan)
Fumiyuki Okabe, Toshiba Machine Co., Ltd. (Japan)
K. Ishibashi, Toshiba Machine Co., Ltd. (Japan)
Shusuke Yoshitake, Toshiba Machine Co., Ltd. (Japan)
Hirokazu Yamada, Toshiba Machine Co., Ltd. (Japan)
Shuichi Tamamushi, Toshiba Machine Co., Ltd. (Japan)
Hirohito Anze, Toshiba Machine Co., Ltd. (Japan)
T. Kamikobo, Toshiba Machine Co., Ltd. (Japan)
Yoji Ogawa, Toshiba Machine Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 4409:
Photomask and Next-Generation Lithography Mask Technology VIII
Hiroichi Kawahira, Editor(s)

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