Share Email Print

Proceedings Paper

Sigma7100: a new architecture for laser pattern generators for 130 nm and beyond
Author(s): Torbjoern Sandstrom; Timothy I. Fillion; Ulric B. Ljungblad; Mats Rosling
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Sigma7100 is a revolutionary new architecture for Laser Pattern Generators being developed by Micronic Laser Systems. The Sigma7100 system design uses a unique architecture based on a spatial light modulator (SLM), a MEMS consisting of a 1 million pixel micro-mirror array fabricated onto a CMOS substrate. The SLM functions as a dynamic mask which is illuminated by a 1kHz DUV excimer laser. A new pattern is calculated and downloaded into the SLM for each laser pulse, and the resultant SLM image is then projected on to the mask substrate. This paper describes the Sigma7100 architecture, presents recent results, and presents a look into the path toward extending the SLM technology to the 70nm node and beyond.

Paper Details

Date Published: 5 September 2001
PDF: 7 pages
Proc. SPIE 4409, Photomask and Next-Generation Lithography Mask Technology VIII, (5 September 2001); doi: 10.1117/12.438402
Show Author Affiliations
Torbjoern Sandstrom, Micronic Laser Systems AB (Sweden)
Timothy I. Fillion, Micronic Laser Systems AB (Sweden)
Ulric B. Ljungblad, Micronic Laser Systems AB (Sweden)
Mats Rosling, Micronic Laser Systems AB (Sweden)

Published in SPIE Proceedings Vol. 4409:
Photomask and Next-Generation Lithography Mask Technology VIII
Hiroichi Kawahira, Editor(s)

© SPIE. Terms of Use
Back to Top