Share Email Print
cover

Proceedings Paper

Longevity of 193-nm/ArF excimer pellicle
Author(s): Takashi Kozeki; Shigeto Shigematsu; Masahiro Kondo; Hiroaki Nakagawa
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Influences of Environment for Pellicle: We irradiated ArF laser in the fluorine polymer membrane set into the atmosphere that mixed artificial air and organic vapor. We obtained the following finding: 1) Organic compounds in the environment had a harmful influence to pellicle. 2) the longevity of the pellicle depended on the kind of the organic compounds. 3) P-Xylene had as 300 times as harmful influence of IPA to pellicle. Influences of Mask Cases for quartz substrate: We set the quartz substrate into the various Mask cases and heated it for 40 degree(s)C, 3 days. After that we checked the change of the transmission rate, the sulfuric acid ion concentration, and ArF laser dosed area. We obtained the following findings: 1)All the Mask Case we investigated had harmful influence to quartz substrate *Transmission reduction of substrate *Haze generation by ArF laser exposure 2) Haze substance was ammonium sulfate or organic compound. By using heat treated cases, the above faultiness was reduced.

Paper Details

Date Published: 5 September 2001
PDF: 9 pages
Proc. SPIE 4409, Photomask and Next-Generation Lithography Mask Technology VIII, (5 September 2001); doi: 10.1117/12.438394
Show Author Affiliations
Takashi Kozeki, Mitsui Chemicals, Inc. (Japan)
Shigeto Shigematsu, Mitsui Chemicals, Inc. (Japan)
Masahiro Kondo, Mitsui Chemicals, Inc. (Japan)
Hiroaki Nakagawa, Mitsui Chemicals, Inc. (Japan)


Published in SPIE Proceedings Vol. 4409:
Photomask and Next-Generation Lithography Mask Technology VIII
Hiroichi Kawahira, Editor(s)

© SPIE. Terms of Use
Back to Top