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Proceedings Paper

Laser mask repair system LM700A
Author(s): Atsushi Ueda; Yoichi Yoshino; Yukio Morishige; Syuichi Watanabe; Yukio Kyusho; Tsutoma Haneda; Makoto Ohmiya
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Paper Abstract

High throughput laser mask repair system satisfying the accuracy demanded for 0.5micrometers pattern rule reticles has been newly developed. The named Laser Mask Repair LM700A has the following versatile features: *Opaque defect repair capability of 0.5micrometers L&S patterns with high repair accuracy of 45nm (3(sigma) ) *Low Quartz damage and high transmission at the repair site, especially for MoSi KrF-HT mask, and applicable to MoSi ArF-HT mask, by newly developed pico-second solid state UV pulse laser *0.1micrometers defect detectability by high resolution UV Optics *Through pellicle repair capability by newly developed long working distance UV objective lens *Auto-edge positioning function for various patterns By utilizing a pico-second UV pulse laser, very high quality laser zapping can be obtained. This paper presents the configuration and the evaluated results for mask repair performance in MoSi KrF-HT and ArF-HT masks.

Paper Details

Date Published: 5 September 2001
PDF: 9 pages
Proc. SPIE 4409, Photomask and Next-Generation Lithography Mask Technology VIII, (5 September 2001); doi: 10.1117/12.438390
Show Author Affiliations
Atsushi Ueda, NEC Corp. (Japan)
Yoichi Yoshino, NEC Corp. (Japan)
Yukio Morishige, NEC Corp. (Japan)
Syuichi Watanabe, NEC Corp. (Japan)
Yukio Kyusho, NEC Corp. (Japan)
Tsutoma Haneda, NEC Corp. (Japan)
Makoto Ohmiya, NEC Corp. (Japan)


Published in SPIE Proceedings Vol. 4409:
Photomask and Next-Generation Lithography Mask Technology VIII
Hiroichi Kawahira, Editor(s)

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