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Proceedings Paper

Multibeam high-resolution UV wavelength reticle inspection
Author(s): Chih-Chien Hung; Chue-San Yoo; Chin-Hsiang Lin; William Waters Volk; James N. Wiley; Steve Khanna; Steve Biellak; D. Wang
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Paper Details

Date Published: 5 September 2001
PDF: 12 pages
Proc. SPIE 4409, Photomask and Next-Generation Lithography Mask Technology VIII, (5 September 2001); doi: 10.1117/12.438387
Show Author Affiliations
Chih-Chien Hung, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Chue-San Yoo, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Chin-Hsiang Lin, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
William Waters Volk, KLA-Tencor Corp. (United States)
James N. Wiley, KLA-Tencor Corp. (United States)
Steve Khanna, KLA-Tencor Corp. (United States)
Steve Biellak, KLA-Tencor Corp. (United States)
D. Wang, KLA-Tencor Corp. (United States)


Published in SPIE Proceedings Vol. 4409:
Photomask and Next-Generation Lithography Mask Technology VIII
Hiroichi Kawahira, Editor(s)

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