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Proceedings Paper

Optical inspection of EUV and SCALPEL reticles
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Paper Abstract

Next Generation Lithography (NGL) reticle inspection poses some difficult problems. The masks dictate that reflection images, rather than the more usual transmission images, be used for inspection. The smaller linewidths and feature sizes of NGL will require the optical inspection images to have better resolution than has been needed for conventional masks. In this paper we present inspection images and inspection results for EUV and EPL programmed defect test reticles using both UV and DUV reticle inspection systems. Our emphasis has been on providing feedback to the mask manufacturing process to help optimize the inspectability of NGL masks, as well as determining whether the required sensitivity for the 100 nm and 70 nm nodes can be met with optical inspection. Simulated and actual images of NGL masks have proven useful in identifying the important factors in optimizing image contrast. We have found that image contrast varies markedly with inspection wavelength, and that the inspection wavelength must be considered in the design of NGL masks if optimum defect sensitivity is to be obtained. This research was sponsored in part by NIST-ATP and KLA-Tencor Cooperative Agreement #70NANB8H44024.

Paper Details

Date Published: 5 September 2001
PDF: 8 pages
Proc. SPIE 4409, Photomask and Next-Generation Lithography Mask Technology VIII, (5 September 2001); doi: 10.1117/12.438384
Show Author Affiliations
Donald W. Pettibone, KLA-Tencor Corp. (United States)
Stanley E. Stokowski, KLA-Tencor Corp. (United States)

Published in SPIE Proceedings Vol. 4409:
Photomask and Next-Generation Lithography Mask Technology VIII
Hiroichi Kawahira, Editor(s)

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