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Proceedings Paper

Advanced FIB mask repair technology for ArF lithography: III
Author(s): Ryoji Hagiwara; Anto Yasaka; Osamu Takaoka; Tomokazu Kozakai; S. Yabe; Yoshihiro Koyama; Masashi Muramatsu; Toshio Doi; Kenji Suzuki; Mamoru Okabe; Kazuo Aita; Tatsuya Adachi; Shinji Kubo; Nobuyuki Yoshioka; Hiroaki Morimoto; Yasutaka Morikawa; Kazuya Iwase; Naoya Hayashi
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Paper Abstract

The design rule of the semiconductor devices is getting dramatically tighter as the progress of lithography technology. Photomask is a key factor to support the lithography technology. Defect repairing technology becomes more important than ever for keeping the photomasks' integrity in the manufacturing processes. When using conventional FIB, however, there are issues of transmission loss due to riverbed and gallium stain for opaque defect repairs as well as the problem raised by halo around repair areas for clear defect repairs. Because of these issues, it is necessary to develop the new FIB mask repairing system for 130nm node. We have been developing the new FIB mask repair system since 1998 and have been testing the repairing performance. The results were published at both PMJ2000 and BACUS2000. This time, we introduce the prototype system's outline, and report preliminary data of imaging damage and repair accuracy for the first time in public.

Paper Details

Date Published: 5 September 2001
PDF: 8 pages
Proc. SPIE 4409, Photomask and Next-Generation Lithography Mask Technology VIII, (5 September 2001); doi: 10.1117/12.438373
Show Author Affiliations
Ryoji Hagiwara, Seiko Instruments, Inc. (Japan)
Anto Yasaka, Seiko Instruments, Inc. (Japan)
Osamu Takaoka, Seiko Instruments, Inc. (Japan)
Tomokazu Kozakai, Seiko Instruments, Inc. (Japan)
S. Yabe, Seiko Instruments, Inc. (Japan)
Yoshihiro Koyama, Seiko Instruments, Inc. (Japan)
Masashi Muramatsu, Seiko Instruments, Inc. (Japan)
Toshio Doi, Seiko Instruments, Inc. (Japan)
Kenji Suzuki, Seiko Instruments, Inc. (Japan)
Mamoru Okabe, Seiko Instruments, Inc. (Japan)
Kazuo Aita, Seiko Instruments, Inc. (Japan)
Tatsuya Adachi, Seiko Instruments, Inc. (Japan)
Shinji Kubo, Semiconductor Leading Edge Technologies, Inc. (Japan)
Nobuyuki Yoshioka, Semiconductor Leading Edge Technologies, Inc. (Japan)
Hiroaki Morimoto, Semiconductor Leading Edge Technologies, Inc. (Japan)
Yasutaka Morikawa, Dai Nippon Printing Co., Ltd. (Japan)
Kazuya Iwase, Dai Nippon Printing Co., Ltd. (Japan)
Naoya Hayashi, Dai Nippon Printing Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 4409:
Photomask and Next-Generation Lithography Mask Technology VIII
Hiroichi Kawahira, Editor(s)

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