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Proceedings Paper

Precise x-ray mask writing technology using advanced 100-kV EB writer EB-X3
Author(s): Yoshinori Nakayama; Hiroshi Watanabe; Shinji Tsuboi; Hajime Aoyama; Mizunori Ezaki; Yasuji Matsui; Tetsuo Morosawa; Masatoshi Oda
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Paper Abstract

Key issues of x-ray mask fabrication are EB mask writer and writing process on thin membrane. This paper shows precise x-ray mask writing technology using 100-kV EB writer on x- ray membrane mask. After several improvements of writing process including non-deformation mask holding and precise temperature control, absolute image placement accuracy within 10nm was obtained for giga-bit level ULSI pattern. Also the delineation characteristics of membrane mask writing using high-energy electron-beam including proximity effect and fogging effect were evaluated. Then accurate critical dimension control within 8 nm was achieved for such high density ULSI patterns. These good results satisfied the mask precision requirements for 100-nm node generation and below. So we fabricated precise x-ray masks having fine patterns of sub 100-nm node device for evaluation of advanced x-ray stepper.

Paper Details

Date Published: 5 September 2001
PDF: 10 pages
Proc. SPIE 4409, Photomask and Next-Generation Lithography Mask Technology VIII, (5 September 2001); doi: 10.1117/12.438364
Show Author Affiliations
Yoshinori Nakayama, Association of Super-Advanced Electronics Technologies (Japan)
Hiroshi Watanabe, Association of Super-Advanced Electronics Technologies (Japan)
Shinji Tsuboi, Association of Super-Advanced Electronics Technologies (Japan)
Hajime Aoyama, Association of Super-Advanced Electronics Technologies (Japan)
Mizunori Ezaki, Association of Super-Advanced Electronics Technologies (Japan)
Yasuji Matsui, Association of Super-Advanced Electronics Technologies (Japan)
Tetsuo Morosawa, Association of Super-Advanced Electronics Technologies (Japan)
Masatoshi Oda, NTT Telecommunications Energy Labs. (Japan)


Published in SPIE Proceedings Vol. 4409:
Photomask and Next-Generation Lithography Mask Technology VIII
Hiroichi Kawahira, Editor(s)

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