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Proceedings Paper

Simulation-based defect printability analysis for 0.13-um technology
Author(s): Cihan Tinaztepe; Ichiro Kagami
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Paper Abstract

This paper describes quantitative evaluation result of a new printability analysis system Printability Analysis Stepper Simulator (PASS).

Paper Details

Date Published: 5 September 2001
PDF: 2 pages
Proc. SPIE 4409, Photomask and Next-Generation Lithography Mask Technology VIII, (5 September 2001); doi: 10.1117/12.438363
Show Author Affiliations
Cihan Tinaztepe, KLA-Tencor Corp. (United States)
Ichiro Kagami, Sony Corp. (Japan)


Published in SPIE Proceedings Vol. 4409:
Photomask and Next-Generation Lithography Mask Technology VIII
Hiroichi Kawahira, Editor(s)

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