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Proceedings Paper

Photomask quality control by Virtual Stepper system for subwavelength photomasks
Author(s): Linard Karklin; Stan Mazor
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Paper Abstract

This work demonstrates the capability of the Virtual Stepper System software tool to evaluate sub-wavelength photo mask quality. A comparison of the results produced by the Virtual Stepper and conventional hardware (AIMS) inspection tools was made. At perfect focus the results are similar, but the results differ wen defocus is considered. Upon investigating this difference a hypothesis was made and then tested using a computer model which confirmed the presence of lens aberrations in the AIMS system.

Paper Details

Date Published: 5 September 2001
PDF: 6 pages
Proc. SPIE 4409, Photomask and Next-Generation Lithography Mask Technology VIII, (5 September 2001); doi: 10.1117/12.438362
Show Author Affiliations
Linard Karklin, Numerical Technologies, Inc. (United States)
Stan Mazor, Numerical Technologies, Inc. (United States)

Published in SPIE Proceedings Vol. 4409:
Photomask and Next-Generation Lithography Mask Technology VIII
Hiroichi Kawahira, Editor(s)

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