Share Email Print
cover

Proceedings Paper

Accuracy of transmittance measurement of inspection machine for semitransparent defect and its detectability
Author(s): Jung-Bae Kim; I. B. Hur; Seong-Ho Jeong; Yong-Seok Son; Kyu-Yong Lee; Sang Woon Lee; Cheol Shin; Hong-Seok Kim
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

As the wafer design rule is getting smaller, the size and transmittance of the defect on the reticle, especially for the semi-transparent defect, is one of the important factors to be controlled in mask shop. In order to minimize controversy for the accuracy of size and transmittance measurement, we need to define the detection and measurement ability of each inspection machine for the half-tone defect. In this work, we make semi-transparent defects with FIB repair tool, SEIKO, and treat this plate with NaOH. We first investigate the delectability of each inspection machine for the semi-transparent defects according to the size and transmittance increase and accuracy of size measuring tool supported in each inspection machine, KLA, lasertec and ORBOT. We verify the measurement result with CD SEM for the size and AIMS for the transmittance.

Paper Details

Date Published: 5 September 2001
PDF: 5 pages
Proc. SPIE 4409, Photomask and Next-Generation Lithography Mask Technology VIII, (5 September 2001); doi: 10.1117/12.438361
Show Author Affiliations
Jung-Bae Kim, DuPont Photomasks Korea Ltd. (South Korea)
I. B. Hur, DuPont Photomasks Korea Ltd. (South Korea)
Seong-Ho Jeong, DuPont Photomasks Korea Ltd. (South Korea)
Yong-Seok Son, DuPont Photomasks Korea Ltd. (South Korea)
Kyu-Yong Lee, DuPont Photomasks Korea Ltd. (South Korea)
Sang Woon Lee, DuPont Photomasks Korea Ltd. (South Korea)
Cheol Shin, DuPont Photomasks Korea Ltd. (South Korea)
Hong-Seok Kim, DuPont Photomasks Korea Ltd. (South Korea)


Published in SPIE Proceedings Vol. 4409:
Photomask and Next-Generation Lithography Mask Technology VIII
Hiroichi Kawahira, Editor(s)

© SPIE. Terms of Use
Back to Top