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Proceedings Paper

Improvement of NLD mask dry etching system
Author(s): Tatsuya Fujisawa; Nobuyuki Yoshioka; Takaei Sasaki; Kazuhide Yamashiro
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Paper Abstract

An advanced photomask dry etching system (NLDE-9035) has been evaluated. The NLD plasma has an advantage to have a capability to control the plasma distribution and density. In our previous work, it has been confirmed to obtain excellent CD uniformity, CD linearity and good pattern fidelity. To improve the CD uniformity further, the neutral loop modulation etching technique has been evaluated. As a result, a further improvement of CD uniformity has been confirmed by using neutral loop (NL) diameter modulation etching technique.

Paper Details

Date Published: 5 September 2001
PDF: 6 pages
Proc. SPIE 4409, Photomask and Next-Generation Lithography Mask Technology VIII, (5 September 2001); doi: 10.1117/12.438356
Show Author Affiliations
Tatsuya Fujisawa, Semiconductor Leading Edge Technologies, Inc. (Japan)
Nobuyuki Yoshioka, Semiconductor Leading Edge Technologies, Inc. (Japan)
Takaei Sasaki, ULVAC Coating Corp. (Japan)
Kazuhide Yamashiro, HOYA Corp. (Japan)


Published in SPIE Proceedings Vol. 4409:
Photomask and Next-Generation Lithography Mask Technology VIII
Hiroichi Kawahira, Editor(s)

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