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Proceedings Paper

Elongation effect of a protecting layer for film life of chemically amplified-type e-beam resist
Author(s): Kakuei Ozawa; Nobunori Abe
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Paper Abstract

Several kinds of hydrophobic or hydrophilic polymers were evaluated in order to survey what kind of polymer improved the film life of chemically amplified resist(CAR) when it's used as a protecting layer. Hydrophilic polymers such as polyacrylic acid(PAA), polyethyleneglycol(PEG) and polyvinyl alcohol(PVA) were not good materials for this purpose, because they couldn't maintain resist property during their storage. Polyolefin(ZEP-AF) was the best polymer, though it caused slightly rough surface of resist patterns.

Paper Details

Date Published: 5 September 2001
PDF: 5 pages
Proc. SPIE 4409, Photomask and Next-Generation Lithography Mask Technology VIII, (5 September 2001); doi: 10.1117/12.438352
Show Author Affiliations
Kakuei Ozawa, ZEON Corp. (Japan)
Nobunori Abe, ZEON Corp. (Japan)

Published in SPIE Proceedings Vol. 4409:
Photomask and Next-Generation Lithography Mask Technology VIII
Hiroichi Kawahira, Editor(s)

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