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Proceedings Paper

Quantitative analysis of mask error effect on wafer CD variation in ArF lithography
Author(s): Sang-Jin Kim; Sang-Sool Koo; Seo-Min Kim; Chang-Nam Ahn; Young-Mog Ham; Ki-Soo Shin
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Paper Details

Date Published: 5 September 2001
PDF: 7 pages
Proc. SPIE 4409, Photomask and Next-Generation Lithography Mask Technology VIII, (5 September 2001); doi: 10.1117/12.438344
Show Author Affiliations
Sang-Jin Kim, Hynix Semiconductor Inc. (South Korea)
Sang-Sool Koo, Hynix Semiconductor Inc. (South Korea)
Seo-Min Kim, Hynix Semiconductor Inc. (South Korea)
Chang-Nam Ahn, Hynix Semiconductor Inc. (South Korea)
Young-Mog Ham, Hynix Semiconductor Inc. (South Korea)
Ki-Soo Shin, Hynix Semiconductor Inc. (South Korea)


Published in SPIE Proceedings Vol. 4409:
Photomask and Next-Generation Lithography Mask Technology VIII
Hiroichi Kawahira, Editor(s)

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