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Proceedings Paper

New mask data verification method after optical proximity effect correction
Author(s): Kazuhisa Ogawa; Isao Ashida; Hiroichi Kawahira
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Paper Abstract

We propose a practical method of verifying mask data after optical proximity effect correction (OPC). The procedure is as follows. 1) Perform OPC using two tools that have different algorithms. 2) compare these OPC data dn if any differences are found, proceed to the next step. 3) Screening regions are defined by the original (pre-OPC) layout and the differences in these regions are filtered. Total CPU time for this verification is about 5 hours for a chip with 4 million gates.

Paper Details

Date Published: 5 September 2001
PDF: 8 pages
Proc. SPIE 4409, Photomask and Next-Generation Lithography Mask Technology VIII, (5 September 2001); doi: 10.1117/12.438340
Show Author Affiliations
Kazuhisa Ogawa, Sony Corp. (Japan)
Isao Ashida, Sony Corp. (Japan)
Hiroichi Kawahira, Sony Corp. (Japan)


Published in SPIE Proceedings Vol. 4409:
Photomask and Next-Generation Lithography Mask Technology VIII
Hiroichi Kawahira, Editor(s)

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