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Proceedings Paper

First performance data obtained on next-generation optical mask metrology tools
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Paper Abstract

To keep pace with continuously shrinking design rules for masks and reticles Leica Microsystems has developed two new mask metrology tools. The LWM 250 DUV is designed to measure Critical Dimensions (CD) on mask in transmitted light at 248nm illumination. The LMS IPR02 is designed to measure pattern placement and CDs in transmitted light at I- line (365nm) illumination. System overview and first performance data are presented for both tools. The step to a shorter illumination wavelength leads to a better optical resolution power resulting in an improved edge detection and CD linearity compared to systems using white light or I-line illumination for imaging.

Paper Details

Date Published: 5 September 2001
PDF: 6 pages
Proc. SPIE 4409, Photomask and Next-Generation Lithography Mask Technology VIII, (5 September 2001); doi: 10.1117/12.438331
Show Author Affiliations
Klaus-Dieter Roeth, Leica Microsystems GmbH (Germany)
Carola Blaesing-Bangert, Leica Microsystems GmbH (Germany)
Herger Alt, Leica Microsystems GmbH (Germany)
Gerhard W.B. Schlueter, Leica Microsystems GmbH (Germany)

Published in SPIE Proceedings Vol. 4409:
Photomask and Next-Generation Lithography Mask Technology VIII
Hiroichi Kawahira, Editor(s)

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