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Proceedings Paper

Scan linearity: a hidden factor in SEM magnification calibration
Author(s): Albert Sicignano; Arkady V. Nikitin; Dmitriy Y. Yeremin; Matthew Sandy; E. Tim Goldburt
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Paper Abstract

Scan linearity of a review (cross-section) Scanning Electron Microscope (SEM) has been studied using Nanometrology’s proprietary software and reference samples. Nonlinearity across the field of view was measured at greater than 6.5% before and under 1% after correction by the SEM company’s engineer. The scan non-linearity was measured with precision better than 0.2% across the field of view. This is in spite of the nonuniformity of the reference sample which was measured at greater than 2.5%. The precision of the non-uniformity measurement of the reference sample was better than 0.1%.

Paper Details

Date Published: 24 July 2002
PDF: 8 pages
Proc. SPIE 4608, Nanostructure Science, Metrology, and Technology, (24 July 2002); doi: 10.1117/12.437972
Show Author Affiliations
Albert Sicignano
Arkady V. Nikitin
Dmitriy Y. Yeremin
Matthew Sandy
E. Tim Goldburt

Published in SPIE Proceedings Vol. 4608:
Nanostructure Science, Metrology, and Technology
Martin C. Peckerar; Michael T. Postek, Editor(s)

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