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Proceedings Paper

Ultrashallow p+ junctions in silicon formed by molecular-beam epitaxy using boron delta doping
Author(s): Philip E. Thompson; Joe Bennett
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Paper Details

Date Published: 24 July 2002
PDF: 9 pages
Proc. SPIE 4608, Nanostructure Science, Metrology, and Technology, (24 July 2002); doi: 10.1117/12.437270
Show Author Affiliations
Philip E. Thompson
Joe Bennett

Published in SPIE Proceedings Vol. 4608:
Nanostructure Science, Metrology, and Technology

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