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Proceedings Paper

Physical effects of evaporated materials in thin films and emission patterns
Author(s): G. Galvez; Guillermo Baldwin-Olguin; Francisco Villa
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Paper Abstract

The present work studies the refraction index and physical thickness variation of deposited thin films over large glass substrates and source emission patterns variation, exclusively due to the type of material in the evaporation process at high vacuum. The employed method consists in varying the evaporated material and so obtaining the thin films physical thickness and refraction index in several points over the substrate through adjustment of the measured transmittance, comparing with the one obtained by simulation. The results show a radial distribution of the refraction index and physical thickness in dielectric thin films due to the material employed.

Paper Details

Date Published: 14 August 2001
PDF: 4 pages
Proc. SPIE 4419, 4th Iberoamerican Meeting on Optics and 7th Latin American Meeting on Optics, Lasers, and Their Applications, (14 August 2001); doi: 10.1117/12.437133
Show Author Affiliations
G. Galvez, Pontificia Univ. Catolica del Peru (Peru)
Guillermo Baldwin-Olguin, Pontificia Univ. Catolica del Peru (Peru)
Francisco Villa, Ctr. de Investigaciones en Optica, AC (Mexico)


Published in SPIE Proceedings Vol. 4419:
4th Iberoamerican Meeting on Optics and 7th Latin American Meeting on Optics, Lasers, and Their Applications

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