Share Email Print

Proceedings Paper

Improved crosslinkable polymeric binders for 193-nm bottom antireflective coatings (BARCs)
Author(s): James D. Meador; Xie Shao; Mandar Bhave; Chris Cox; John Thompson; Debra L. Thomas; Stephen Gibbons; Ashley Farnsworth; Michael D. Rich
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The list of desired properties for a spin-on 193-nm BARC steadily increases. In response, crosslinkable polymers from different chemical families than the conventional acrylics and vinyls are being studied for applicability in preparing improved thermosetting BARCs. Alternate polymer platforms discussed in this paper include polyethers, polyesters, polyurethanes, and polysaccharides. A BARC that uses a blend or mixture of commercially-available polymers for the binder is highlighted and the product's performance is described. The BARC parameters that are discussed include film properties, flash point, optical data and reflectivity, solution and spin-bowl compatibility, plasma etching rate, resist profile, conformality, and metals content. Based on the test results outlined in this paper, the polymer blend BARC JM2218-56 is expected to advance towards commercialization.

Paper Details

Date Published: 24 August 2001
PDF: 9 pages
Proc. SPIE 4345, Advances in Resist Technology and Processing XVIII, (24 August 2001); doi: 10.1117/12.436918
Show Author Affiliations
James D. Meador, Brewer Science, Inc. (United States)
Xie Shao, Brewer Science, Inc. (United States)
Mandar Bhave, Brewer Science, Inc. (United States)
Chris Cox, Brewer Science, Inc. (United States)
John Thompson, Brewer Science, Inc. (United States)
Debra L. Thomas, Brewer Science, Inc. (United States)
Stephen Gibbons, Brewer Science, Inc. (United States)
Ashley Farnsworth, Brewer Science, Inc. (United States)
Michael D. Rich, Brewer Science, Inc. (United States)

Published in SPIE Proceedings Vol. 4345:
Advances in Resist Technology and Processing XVIII
Francis M. Houlihan, Editor(s)

© SPIE. Terms of Use
Back to Top