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Proceedings Paper

Continuous metal removal technique for resist resins
Author(s): Stan F. Wanat; Douglas S. McKenzie; M. Dalil Rahman
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Paper Abstract

Modern resists require very pure raw materials to insure highest quality images. Many methods have been developed to reduce metals in resins used to make photoresists. Extractive washing techniques and ion exchange methods have been the predominant methods used to reduce metal levels for these critical raw materials. This has been especially important for the novolak resins because of the generally poor quality of the starting materials used to make them and by the nature of the resin isolation steps traditionally used. Both of the commonly used cleaning methods are time consuming and are predominantly batch processes. Based upon techniques developed to efficiently fractionate resins, we have developed a technique for the rapid, continuous reduction of metal contaminants in film forming resin solutions by an extractive method using a double inlet liquid/liquid centrifuge.

Paper Details

Date Published: 24 August 2001
PDF: 8 pages
Proc. SPIE 4345, Advances in Resist Technology and Processing XVIII, (24 August 2001); doi: 10.1117/12.436877
Show Author Affiliations
Stan F. Wanat, Clariant Corp. (United States)
Douglas S. McKenzie, Clariant Corp. (United States)
M. Dalil Rahman, Clariant Corp. (United States)


Published in SPIE Proceedings Vol. 4345:
Advances in Resist Technology and Processing XVIII
Francis M. Houlihan, Editor(s)

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