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Proceedings Paper

Characterization of thin and ultrathin polymer and resist films
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Paper Abstract

The need for a better understanding of the physiochemical properties of radiation-sensitive thin polymer coatings for lithographic applications is driven by the trend of ever- shrinking pattern dimensions and film thickness, imposed by the semiconductor industry. In this work, we address the issue of film uniformity and moisture absorption for thin and ultrathin films (250nm to 50nm) of poly 4-hydroxystyrene (PHS). Using high resolution x-ray reflectivity, the roughness and density of spin coated films was found to remain constant within experimental error for the thickness range examined. Also, water uptake on PHS films was studied by neutron and x-ray reflectivity. Exposure of the polymer film to a controlled humidity level is shown to swell the polymer and be absorbed uniformly throughout the film. No preferential absorption of water at the interface was noticed, regardless of the hydrophilic or hydrophobic nature of the substrate surface. Overall density changes in the polymer matrix due to the moisture-induced increase in the film thickness are also discussed.

Paper Details

Date Published: 24 August 2001
PDF: 9 pages
Proc. SPIE 4345, Advances in Resist Technology and Processing XVIII, (24 August 2001); doi: 10.1117/12.436863
Show Author Affiliations
Dario L. Goldfarb, IBM Thomas J. Watson Research Ctr. (United States)
Qinghuang Lin, IBM Thomas J. Watson Research Ctr. (United States)
Marie Angelopoulos, IBM Thomas J. Watson Research Ctr. (United States)
Christopher L. Soles, National Institute of Standards and Technology (United States)
Eric K. Lin, National Institute of Standards and Technology (United States)
Wen-li Wu, National Institute of Standards and Technology (United States)


Published in SPIE Proceedings Vol. 4345:
Advances in Resist Technology and Processing XVIII
Francis M. Houlihan, Editor(s)

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