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Proceedings Paper

Novel hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate for 193-nm resist compositions
Author(s): M. Dalil Rahman; Douglas S. McKenzie; Jun-Bom Bae; Takanori Kudo; Woo-Kyu Kim; Munirathna Padmanaban; Ralph R. Dammel
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Paper Abstract

A novel process for the preparation of hybrid copolymers based on cycloolefin-maleic anhydride and methacrylate (COMA/Methacrylate) monomers has been developed. A variety of copolymers have been synthesized form t-butylnorbonene carboxylate (BNC), hydroxyethylnorbornene carboxylate (HNC), and norbornene carboxylic acid (NC) with different types of methacrylate monomers such as 2-methyl-2-adamantyl- methacrylate(MAdMA), mevalonic lactone methacrylate(MLMA) and maleic anhydride (MA). The effect of the different types of monomers and the ratios of monomers in the copolymer on lithographic performance has been studied. Lithographic evaluation of some of these polymers has shown resolution down to 80nm for semi and fully isolated lines using conventional 193nm illumination and standard development conditions. This paper will report the chemistry of the hybrid polymer platforms and the progress of our effort to develop 193 resist for semi-dense and isolated line applications.

Paper Details

Date Published: 24 August 2001
PDF: 9 pages
Proc. SPIE 4345, Advances in Resist Technology and Processing XVIII, (24 August 2001); doi: 10.1117/12.436845
Show Author Affiliations
M. Dalil Rahman, Clariant Corp. (United States)
Douglas S. McKenzie, Clariant Corp. (United States)
Jun-Bom Bae, Clariant Corp. (United States)
Takanori Kudo, Clariant Corp. (United States)
Woo-Kyu Kim, Clariant Corp. (United States)
Munirathna Padmanaban, Clariant Corp. (United States)
Ralph R. Dammel, Clariant Corp. (United States)

Published in SPIE Proceedings Vol. 4345:
Advances in Resist Technology and Processing XVIII
Francis M. Houlihan, Editor(s)

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