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Proceedings Paper

Novel high-performance ArF resist for sub-100-nm lithography
Author(s): Geunsu Lee; Cha-Won Koh; Jae Chang Jung; Min-Ho Jung; Keun-Kyu Kong; Jin-Soo Kim; Ki-Soo Shin; Se-Jin Choi; Yang-Sook Kim; Yong-Jun Choi; Deog-Bae Kim
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Paper Abstract

We have developed several COMA (Cycloolefin-maleic anhydride) type resists and demonstrated their good lithographic performances, especially in the isolated line. Our resist (DHA-H110) was newly upgraded for the manufacturing of sub-100nm device in terms of bulk slope, LER (Line Edge Roughness), CD Linearity, and matching with substrate to prevent pattern collapse. The chemical structure of base resin was almost unchanged. The bulk slope resulted from high absorbency of the matrix resin was successfully overcome by introducing new additive, S1, which is an agent to remove not only top loss but also footing in the bottom. In real device application, DHA-H110 exhibits better adhesion and smaller LER than acrylate type resists on organic BARC. In addition, it shows superior pattern profile after etch process to acrylate type resists. In this paper, we suggest resist related issues for sub-100nm patterning and present lithographic performances of DHA-H110 in detail.

Paper Details

Date Published: 24 August 2001
PDF: 9 pages
Proc. SPIE 4345, Advances in Resist Technology and Processing XVIII, (24 August 2001); doi: 10.1117/12.436843
Show Author Affiliations
Geunsu Lee, Hyundai Electronics Industries Co., Ltd. (South Korea)
Cha-Won Koh, Hyundai Electronics Industries Co., Ltd. (South Korea)
Jae Chang Jung, Hyundai Electronics Industries Co., Ltd. (South Korea)
Min-Ho Jung, Hyundai Electronics Industries Co., Ltd. (South Korea)
Keun-Kyu Kong, Hyundai Electronics Industries Co. Ltd. (South Korea)
Jin-Soo Kim, Hyundai Electronics Industries Co., Ltd. (South Korea)
Ki-Soo Shin, Hyundai Electronics Industries Co., Ltd. (South Korea)
Se-Jin Choi, DongJin Semichem Co., Ltd. (South Korea)
Yang-Sook Kim, DongJin Semichem Co., Ltd. (South Korea)
Yong-Jun Choi, DongJin Semichem Co., Ltd. (South Korea)
Deog-Bae Kim, DongJin Semichem Co., Ltd. (South Korea)


Published in SPIE Proceedings Vol. 4345:
Advances in Resist Technology and Processing XVIII
Francis M. Houlihan, Editor(s)

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