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Proceedings Paper

SEM sentinel-SEM performance measurement system
Author(s): Bradley N. Damazo; Andras E. Vladar; Alice V. Ling; M. Alkan Donmez; Michael T. Postek; E. C. Jayewardene
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Paper Abstract

This paper describes the design and implementation of a system for monitoring the performance of several major subsystems of a critical dimension measurement scanning electron microscope (CD-SEM). Experiments were performed for tests involving diagnosis of the vacuum system and column stability by monitoring of the following subsystems and associated functional parameters. These include: 1) Vacuum system with pressure as a function of time being recorded for the electron-optical column (gun chamber), the specimen chamber, and the sample-loading unit. 2) The action of several components of the wafer handling system can be timed. 3) The electron gun emission currents and other signals to monitor the characteristics of the condenser and objective lenses may be used to correlate with image quality. 4) Image sharpness, electron beam current, signal-to-noise ratio, etc. can be evaluated.

Paper Details

Date Published: 22 August 2001
PDF: 10 pages
Proc. SPIE 4344, Metrology, Inspection, and Process Control for Microlithography XV, (22 August 2001); doi: 10.1117/12.436805
Show Author Affiliations
Bradley N. Damazo, National Institute of Standards and Technology (United States)
Andras E. Vladar, National Institute of Standards and Technology (United States)
Alice V. Ling, National Institute of Standards and Technology (United States)
M. Alkan Donmez, National Institute of Standards and Technology (United States)
Michael T. Postek, National Institute of Standards and Technology (United States)
E. C. Jayewardene, National Institute of Standards and Technology (United States)


Published in SPIE Proceedings Vol. 4344:
Metrology, Inspection, and Process Control for Microlithography XV
Neal T. Sullivan, Editor(s)

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