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Proceedings Paper

Extended ATHENA alignment performance and application for the 100-nm technology node
Author(s): Ramon Navarro; Stefan Keij; Arie J. den Boef; Sicco Schets; Frank van Bilsen; Geert Simons; Ron Schuurhuis; Jaap Burghoorn
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Paper Details

Date Published: 22 August 2001
PDF: 13 pages
Proc. SPIE 4344, Metrology, Inspection, and Process Control for Microlithography XV, (22 August 2001); doi: 10.1117/12.436795
Show Author Affiliations
Ramon Navarro, ASML (Netherlands)
Stefan Keij, ASML (Netherlands)
Arie J. den Boef, ASML (Netherlands)
Sicco Schets, ASML (Netherlands)
Frank van Bilsen, ASML (Netherlands)
Geert Simons, ASML (Netherlands)
Ron Schuurhuis, ASML (Netherlands)
Jaap Burghoorn, ASML (Netherlands)


Published in SPIE Proceedings Vol. 4344:
Metrology, Inspection, and Process Control for Microlithography XV
Neal T. Sullivan, Editor(s)

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