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Proceedings Paper

Swing curve phase and amplitude effects in optical lithography
Author(s): Brian Martin; Tom Tighe; Graham G. Arthur
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Paper Abstract

Resist swing curves have been constructed practically, and by lithography modeling, for a conventional I-line resist both for dimensions at the substrate interface and at the top of the resist. Top SEM linewidth measurements were difficult to take repeatably in automatic mode so an enhanced measurement technique was developed. The effect of stepper focus on swing curve amplitude has been studied and, for substrate dimensions, amplitude increases as focus moves away from its optimum setting.

Paper Details

Date Published: 22 August 2001
PDF: 7 pages
Proc. SPIE 4344, Metrology, Inspection, and Process Control for Microlithography XV, (22 August 2001); doi: 10.1117/12.436785
Show Author Affiliations
Brian Martin, Mitel Semiconductor (United Kingdom)
Tom Tighe, Mitel Semiconductor (United Kingdom)
Graham G. Arthur, Rutherford Appleton Lab. (United Kingdom)

Published in SPIE Proceedings Vol. 4344:
Metrology, Inspection, and Process Control for Microlithography XV
Neal T. Sullivan, Editor(s)

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