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Proceedings Paper

Microeconomics of 300-mm process module control
Author(s): Kevin M. Monahan; Arun K. Chatterjee; Georges Falessi; Ady Levy; Meryl D. Stoller
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Paper Abstract

Simple microeconomic models that directly link metrology, yield, and profitability are rare or non-existent. In this work, we validate and apply such a model. Using a small number of input parameters, we explain current yield management practices in 200 mm factories. The model is then used to extrapolate requirements for 300 mm factories, including the impact of simultaneous technology transitions to 130nm lithography and integrated metrology. To support our conclusions, we use examples relevant to factory-wide photo module control.

Paper Details

Date Published: 22 August 2001
PDF: 14 pages
Proc. SPIE 4344, Metrology, Inspection, and Process Control for Microlithography XV, (22 August 2001); doi: 10.1117/12.436774
Show Author Affiliations
Kevin M. Monahan, KLA-Tencor Corp. (United States)
Arun K. Chatterjee, KLA-Tencor Corp. (United States)
Georges Falessi, KLA-Tencor Corp. (United States)
Ady Levy, KLA-Tencor Corp. (United States)
Meryl D. Stoller, KLA-Tencor Corp. (United States)

Published in SPIE Proceedings Vol. 4344:
Metrology, Inspection, and Process Control for Microlithography XV
Neal T. Sullivan, Editor(s)

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