Share Email Print
cover

Proceedings Paper

High-accuracy EUV metrology of PTB using synchrotron radiation
Author(s): Frank Scholze; Burkhard Beckhoff; G. Brandt; R. Fliegauf; Alexander Gottwald; Roman Klein; Bernd Meyer; U. D. Schwarz; R. Thornagel; Johannes Tuemmler; Klaus Vogel; J. Weser; Gerhard Ulm
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The development of EUV lithography, has made high-accuracy at-wavelength metrology necessary. Radiometry using synchrotron radiation has been performed by the German national metrology institute, the Physikalisch-Technische Bundesanstalt (PTB), for almost 20 years. Recently, PTB has set up four new beamlines for EUV metrology at the electron storage ring BESSY II. At a bending magnet, a monochromator for soft X-ray radiometry is routinely used for reflectometry and detector characterisation. A reflectometer designed for mirrors up to 550 mm in diameter and 50 kg in mass will be operational in January 2002. Detector characterisation is based on a primary detector standard, a cryogenic electrical substitution radiometer. Measuring tools for EUV source characterisation are calibrated on this basis. Detector testing at irradiation levels comparable to the anticipated conditions in EUV tools is feasible at a plane grating monochromator, installed at an undulator optimised for EUV radiation. A test beamline for EUV optics alignment and system metrology has been installed, using undispersed undulator radiation. Bending magnet radiation is available at a station for irradiation testing. A focusing mirror collects a radiant power of about 10 mW within the multilayer bandwidth and a 1 mm² focal spot.

Paper Details

Date Published: 22 August 2001
PDF: 12 pages
Proc. SPIE 4344, Metrology, Inspection, and Process Control for Microlithography XV, (22 August 2001); doi: 10.1117/12.436766
Show Author Affiliations
Frank Scholze, Physikalisch-Technische Bundesanstalt (Germany)
Burkhard Beckhoff, Physikalisch-Technische Bundesanstalt (Germany)
G. Brandt, Physikalisch-Technische Bundesanstalt (Germany)
R. Fliegauf, Physikalisch-Technische Bundesanstalt (Germany)
Alexander Gottwald, Physikalisch-Technische Bundesanstalt (Germany)
Roman Klein, Physikalisch-Technische Bundesanstalt (Germany)
Bernd Meyer, Physikalisch-Technische Bundesanstalt (Germany)
U. D. Schwarz, Physikalisch-Technische Bundesanstalt (Germany)
R. Thornagel, Physikalisch-Technische Bundesanstalt (Germany)
Johannes Tuemmler, Physikalisch Technische Bundesanstalt (Germany)
Klaus Vogel, Physikalisch-Technische Bundesanstalt (Germany)
J. Weser, Physikalisch-Technische Bundesanstalt (Germany)
Gerhard Ulm, Physikalisch-Technische Bundesanstalt (Germany)


Published in SPIE Proceedings Vol. 4344:
Metrology, Inspection, and Process Control for Microlithography XV
Neal T. Sullivan, Editor(s)

© SPIE. Terms of Use
Back to Top