Share Email Print
cover

Proceedings Paper

Metrology and analysis of two-dimensional SEM patterns
Author(s): Chris A. Mack; Sven Jug; Rob Jones; Prasad Apte; Scott Richard Williams; Mike Pochkowski
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Details

Date Published: 22 August 2001
PDF: 8 pages
Proc. SPIE 4344, Metrology, Inspection, and Process Control for Microlithography XV, (22 August 2001); doi: 10.1117/12.436763
Show Author Affiliations
Chris A. Mack, KLA-Tencor Corp. (United States)
Sven Jug, KLA-Tencor Corp. (United States)
Rob Jones, KLA-Tencor Corp. (United States)
Prasad Apte, KLA-Tencor Corp. (United States)
Scott Richard Williams, KLA-Tencor Corp. (United States)
Mike Pochkowski, KLA-Tencor Corp. (United States)


Published in SPIE Proceedings Vol. 4344:
Metrology, Inspection, and Process Control for Microlithography XV
Neal T. Sullivan, Editor(s)

© SPIE. Terms of Use
Back to Top