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Proceedings Paper

Determination of best focus and exposure dose using CD-SEM sidewall imaging
Author(s): Thomas Marschner; Guy Eytan; Ophir Dror
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Paper Details

Date Published: 22 August 2001
PDF: 11 pages
Proc. SPIE 4344, Metrology, Inspection, and Process Control for Microlithography XV, (22 August 2001); doi: 10.1117/12.436761
Show Author Affiliations
Thomas Marschner, Infineon Technologies GmbH (Germany)
Guy Eytan, Applied Materials (Israel)
Ophir Dror, Applied Materials (Israel)


Published in SPIE Proceedings Vol. 4344:
Metrology, Inspection, and Process Control for Microlithography XV
Neal T. Sullivan, Editor(s)

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