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Proceedings Paper

Practical monitor and control of SEM astigmatism in manufacturing
Author(s): Sandra R. Dupuis; Timothy S. Hayes; Charles N. Archie; Eric P. Solecky
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Paper Details

Date Published: 22 August 2001
PDF: 11 pages
Proc. SPIE 4344, Metrology, Inspection, and Process Control for Microlithography XV, (22 August 2001); doi: 10.1117/12.436760
Show Author Affiliations
Sandra R. Dupuis, IBM Microelectronics Div. (United States)
Timothy S. Hayes, IBM Microelectronics Div. (United States)
Charles N. Archie, IBM Advanced Semiconductor Technology Ctr. (United States)
Eric P. Solecky, IBM Advanced Semiconductor Technology Ctr. (United States)


Published in SPIE Proceedings Vol. 4344:
Metrology, Inspection, and Process Control for Microlithography XV
Neal T. Sullivan, Editor(s)

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