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Proceedings Paper

Investigation of full-field CD control of sub-100-nm gate features by phase-shift 248-nm lithography
Author(s): Michael Fritze; Brian Tyrrell; David K. Astolfi; Paul Davis; Bruce Wheeler; Renee D. Mallen; J. Jarmolowicz; Susan G. Cann; David Y. Chan; Peter D. Rhyins; Martin E. Mastovich; Neal T. Sullivan; Robert Brandom; Chris Carney; John E. Ferri; B. A. Blachowicz
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Paper Details

Date Published: 22 August 2001
PDF: 10 pages
Proc. SPIE 4344, Metrology, Inspection, and Process Control for Microlithography XV, (22 August 2001); doi: 10.1117/12.436759
Show Author Affiliations
Michael Fritze, MIT Lincoln Lab. (United States)
Brian Tyrrell, MIT Lincoln Lab. (United States)
David K. Astolfi, MIT Lincoln Lab. (United States)
Paul Davis, MIT Lincoln Lab. (United States)
Bruce Wheeler, MIT Lincoln Lab. (United States)
Renee D. Mallen, MIT Lincoln Lab. (United States)
J. Jarmolowicz, MIT Lincoln Lab. (United States)
Susan G. Cann, MIT Lincoln Lab. (United States)
David Y. Chan, Photronics, Inc. (United States)
Peter D. Rhyins, Photronics, Inc. (United States)
Martin E. Mastovich, Schlumberger Semiconductor Solutions (United States)
Neal T. Sullivan, Schlumberger Semiconductor Solutions (United States)
Robert Brandom, Schlumberger Semiconductor Solutions (United States)
Chris Carney, Arch Chemicals, Inc. (United States)
John E. Ferri, Arch Chemicals, Inc. (United States)
B. A. Blachowicz, Arch Chemicals, Inc. (United States)


Published in SPIE Proceedings Vol. 4344:
Metrology, Inspection, and Process Control for Microlithography XV
Neal T. Sullivan, Editor(s)

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