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Proceedings Paper

Evaluation of the dual-exposure technique
Author(s): Harry Sewell; Victor F. Bunze; Nicholas DeLuca; Diane C. McCafferty
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Paper Details

Date Published: 22 August 2001
PDF: 11 pages
Proc. SPIE 4344, Metrology, Inspection, and Process Control for Microlithography XV, (22 August 2001); doi: 10.1117/12.436758
Show Author Affiliations
Harry Sewell, SVG Lithography Systems, Inc. (United States)
Victor F. Bunze, SVG Lithography Systems, Inc. (United States)
Nicholas DeLuca, SVG Lithography Systems, Inc. (United States)
Diane C. McCafferty, SVG Lithography Systems, Inc. (United States)


Published in SPIE Proceedings Vol. 4344:
Metrology, Inspection, and Process Control for Microlithography XV
Neal T. Sullivan, Editor(s)

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