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Proceedings Paper

PREVAIL-EPL alpha tool electron optics subsystem
Author(s): Hans C. Pfeiffer; Rajinder S. Dhaliwal; Steven D. Golladay; Samuel K. Doran; Michael S. Gordon; Rodney A. Kendall; Jon E. Lieberman; David J. Pinckney; Robert J. Quickle; Christopher F. Robinson; James D. Rockrohr; Werner Stickel; Eileen V. Tressler
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Paper Abstract

The IBM/Nikon alliance is continuing pursuit of an EPL stepper alpha tool based on the PREVAIL technology. This paper provides a status report of the alliance activity with particular focus on the Electron Optical Subsystem developed at IBM. We have previously reported on design features of the PREVAIL alpha system. The new state-of-the-art e-beam lithography concepts have since been reduced to practice and turned into functional building blocks of a production level lithography tool. The electron optical alpha tool subsystem has been designed, build, assembled and tested at IBM's Semiconductor Research and Development Center (SRDC) in East Fishkill, New York. After demonstrating subsystem functionality, the electron optical column and all associated control electronics hardware and software have been shipped during January 2001 to Nikon's facility in Kumagaya, Japan, for integration into the Nikon commercial e-beam stepper alpha tool. Early pre-shipment results obtained with this electron optical subsystem are presented.

Paper Details

Date Published: 20 August 2001
PDF: 10 pages
Proc. SPIE 4343, Emerging Lithographic Technologies V, (20 August 2001); doi: 10.1117/12.436711
Show Author Affiliations
Hans C. Pfeiffer, IBM Microelectronics (United States)
Rajinder S. Dhaliwal, IBM Microelectronics (United States)
Steven D. Golladay, IBM Microelectronics (United States)
Samuel K. Doran, IBM Microelectronics (United States)
Michael S. Gordon, IBM Microelectronics (United States)
Rodney A. Kendall, IBM Microelectronics (United States)
Jon E. Lieberman, IBM Microelectronics (United States)
David J. Pinckney, IBM Microelectronics (United States)
Robert J. Quickle, IBM Microelectronics (United States)
Christopher F. Robinson, IBM Microelectronics (United States)
James D. Rockrohr, IBM Microelectronics (United States)
Werner Stickel, IBM Microelectronics (United States)
Eileen V. Tressler, IBM Microelectronics (United States)


Published in SPIE Proceedings Vol. 4343:
Emerging Lithographic Technologies V
Elizabeth A. Dobisz, Editor(s)

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