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Proceedings Paper

Optimal lithium targets for laser-plasma lithography
Author(s): Alexander A. Andreev; T. Ueda; Jiri Limpouch
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Paper Abstract

Lithium containing droplet and cluster targets irradiated by laser pulses are proposed as prospective source of for soft x-ray lithography. Analytical model and simulations show that laser with repetition rate of several MHz with energy of several mJ and pulse duration 10 ps is required.

Paper Details

Date Published: 20 August 2001
PDF: 8 pages
Proc. SPIE 4343, Emerging Lithographic Technologies V, (20 August 2001); doi: 10.1117/12.436706
Show Author Affiliations
Alexander A. Andreev, Yokogawa Electric Corp. (Japan) and Institute for Laser Physics (Japan)
T. Ueda, Yokogawa Electronic Corp. (Russia)
Jiri Limpouch, Czech Technical Univ. (Czech Republic)

Published in SPIE Proceedings Vol. 4343:
Emerging Lithographic Technologies V
Elizabeth A. Dobisz, Editor(s)

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