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Proceedings Paper

Highly accurate CD control at stitching region for electron-beam projection lithography
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Paper Abstract

For electron beam projection lithography system, it is one of the most important issues to stitch desired patterns accurately. We have found a way to stitch the patterns with high accurate critical dimension by a pattern edge deformation that moderates a stitching error by as much as 2.5 times compared with no-deformed edge.

Paper Details

Date Published: 20 August 2001
PDF: 9 pages
Proc. SPIE 4343, Emerging Lithographic Technologies V, (20 August 2001); doi: 10.1117/12.436696
Show Author Affiliations
Tomoharu Fujiwara, Nikon Corp. (Japan)
Takeshi Irita, Nikon Corp. (Japan)
Sumito Shimizu, Nikon Corp. (Japan)
Hajime Yamamoto, Nikon Corp. (Japan)
Kazuaki Suzuki, Nikon Corp. (Japan)

Published in SPIE Proceedings Vol. 4343:
Emerging Lithographic Technologies V
Elizabeth A. Dobisz, Editor(s)

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